A lot has been happening around the extreme UV (EUV) lithography needed for the next generation of high performance chips, from a new billion dollar centre in the US to cash for Corning to develop new glass for the machines.
US funds $1bn centre with ASML for EUV lithography. ...
The EUV Accelerator
will focus on developing state of the art high numerical aperture EUV technology
and the R&D that relies on it. The US says ...
Power is next challenge for EUV lithography .. ...
The rollout of
extreme ultraviolet (EUV) lithography could be hit by the increasing power
requirements of the technology.
£32m for new EUV glass in the US .. ...
Corning in the US
is to receive a grant of $32m to boost production of specialist glass for EUV lithography
equipment.
Imec, ASML show logic and DRAM built with High NA EUV ...
Belgian research
lab imec has shown patterned structures obtained after exposure with a 0.55NA
high numerical aperture EUV scanner.
ASML has started shipping second high-NA EUV litho system ...
The price of the
high-NA EUV exposure machine is said to be about US$380 million or
more than twice the approximately US$180 million of the ...
Intel video shows high-NA EUV lithography machine ...
Intel has
released a video showing a Twinscan EXE:5200 high numerial aperture extreme
ultraviolet lithography tool arriving at its fab in Hillsboro, Oregon.
ASML, imec open joint high NA EUV lithography lab .. ...
ASML and imec
have opened a European joint lab for High NA EUV lithography to offer
an early development platform to the leading-edge semiconductor companies.
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